家榮股份有限公司

Specification of MEGCON Ⅱ
Series		General-purpose series PRCII-(model numbers Listed below)				CE marking series *4 FRCII-(model numbers listed below)
Model	Rack	1000AD	1200AD	2000AD	1220AD	-	-
	Cabinet Standard/E type *1 S / ES type	1000ACD	1200ACD	2000ACD	1220ACD	1000ACD-E	2000ACD-E
		1000ACD-S	1200ACD-S	20000ACD-S	1220ACD-S	1000ACD-ES	2000ACD-ES
Performance	Maximum flow (L/h)	1000	1000	2000	2000	1000	1000
	Control range *2 (MΩ·cm)	0.2~2	0.1~0.5	0.2~2	0.15~1	0.2~2	0.2~2
Membrane drying mechanism		Internal air pump type				External air supply type
Ultrapure water Connection port	Rack	Hose nozzle (for ID Ø19 braided hose)				-
	Cabinet	Rc 1/2		Rc 3/4		Rc 3/4
Dimensions	Rack	480W x 355D x200H mm				-
	Cabinet ( S / ES)	520W x 400D x 1150(1415)H mm				520W x 470D x 1150(1390) H mm
Weight	Rack	15 kg				-
	Cabinet	65 kg				65 kg
Power		AC100-240 V (50 / 60 Hz)( AC100-120 V unless specifically requested )				AC 100-240 V (50 / 60 Hz)
Material of parts contacting the water		Cell ( CO2 gas injection part )àPP Tube à PVC ,braided hose				Cell ( CO2 gas injection part )àPP Tube à SUS304 ,PP,braided hose
Paint color	Cabinet	Munsell 2.5Y8/2				Munsell 2.5GY8.0/0.5
Standard accessories *3	Rack	Instruction manual ,inspection results certificate				-
	Cabinet	Instruction manual ,inspection results certificate100-120 V power:Power cord(for AC100-120V )+plug 200-240 V power:Power cord ( for AC200-240V )(For cases other than the above ,the necessary parts must be prepared by the customer.)				Instruction manual , inspection results certificate Power cord (for AC100-240V) +Europe-type plug

1: S type includes a 2-color lamp with buzzer + casters with levelers.
))))ES type includes a 2-color lamp with buzzer + data output terminal box + data storage system.
2: The minimum specific resistance is the final value at a flow of approximately 500 L/h.
3: The following additional accessories are available. It is recommended that a spare cell be kept on hand at all times in case of trouble.
)))■ Spare cell
)))■ Specific resistance certificate
)))■ Specific resistance sensor for point-of-use monitoring
)))■ Data storage system (compatible OS: Windows2000, XP, Vista; connection: d-sub 9-pin)
4: CE marking is a safety standard and labeling system that was established by EU directive.
5. The specifications and other information listed here may be changed without notice.

● To ensure safe use of the product
● Be sure to read the instruction manual before using the product, and to use the product correctly.
● Observe the most recent laws of the country where the product is installed that are
))))related to high-pressure gas devices such as the CO2 gas cylinder used to supply CO2 gas,
))))and manage the safety of these gas devices, including
))) by performing regular inspections.

Ultrapure Water Cleaning
Electrostatic damage When there is friction between nonconductors of different materials, 　static electricity is generated. 　The causes of static electricity include friction, separation, impact, streaming, etc. 　There is much danger of static electricity generation in the cleaning process. ●Electrostatic discharge damage 　Fine wiring can be damaged by static electricity. 　The wiring and transistors in liquid crystal displays (TFT) can be damaged. 　Damage to even a single location in the minute pattern can lead to quality problems occuring for the entire product. ●Particle reattachment 　When static electricity is formed, not only is it difficult to separate foreign particles, 　but the problem of foreign 　particles that have already 　been detached being attracted and attached again also occurs. 　here is also the problem of cutting particles becoming reattached to important parts of the wafer during the dicing process, 　resulting in defects occurring in later processes such as bonding. 　Applications 　　1. Mask, reticle 　　2. Wafer process 　　3. Dicing process 　　4. Liquid crystal process 　　5. CMP process 　Etc. 　Resistivity ,wafer temperature,flow 　Ultrapure water 　Resistivity at point 　Flow 　Pc 　Cleaner

Ultrapure Water Cleaning

　Electrostatic damage When there is friction between nonconductors of different materials,
　static electricity is generated.
　The causes of static electricity include friction, separation, impact, streaming, etc.
　There is much danger of static electricity generation in the cleaning process.

●Electrostatic discharge damage

　Fine wiring can be damaged by static electricity.
　The wiring and transistors in liquid crystal displays (TFT) can be damaged.
　Damage to even a single location in the minute pattern can lead to quality problems occuring for the entire product.

●Particle reattachment

　When static electricity is formed, not only is it difficult to separate foreign particles,
　but the problem of foreign 　particles that have already
　been detached being attracted and attached again also occurs.
　here is also the problem of cutting particles becoming reattached to important parts of the wafer during the dicing process,
　resulting in defects occurring in later processes such as bonding.

　Applications
　　1. Mask, reticle
　　2. Wafer process
　　3. Dicing process
　　4. Liquid crystal process
　　5. CMP process
　Etc.
　Resistivity ,wafer temperature,flow
　Ultrapure water
　Resistivity at point
　Flow
　Pc
　Cleaner

Features of MEGCON Ⅱ
The MEGCON Ⅱ aims to increase the efficiency of cleaning processes and has improved functionality. 　　■ Automatic control system 　The following control methods can be used according to the application, allowing the device to be utilized in 　its optimum state. 　● Sensor measurement control 　● Dissociation calculation control 　● Flow input control . 　■ Membrane drying mechanism 　Maintenance of performance and the life of the membrane have been greatly improved by installing an obstruction 　　removal mechanism that uses vapor in the gas inlet. 　　■ Point of use monitor(optional) 　The actual resistivity at the point of use of the cleaning operation can be measured. 　　■ As part of our new corresponding product series, we have released MEGCON II with CE marking. 　　■ Data storage system(optional) 　Data for resistivity, temperature and flow can be fed into a personal computer and displayed on a graph. 　The data is stored and can be utilized in quality control of cleaning operations. 　If the carbon dioxide gas level alarm has been installed,the gas level can be viewed on screen.

Features of MEGCON Ⅱ

　The MEGCON Ⅱ aims to increase the efficiency of cleaning processes and has improved functionality.

　　■ Automatic control system

　The following control methods can be used according to the application, allowing the device to be utilized in
　its optimum state.
　● Sensor measurement control
　● Dissociation calculation control
　● Flow input control .

　■ Membrane drying mechanism

　Maintenance of performance and the life of the membrane have been greatly improved by installing an obstruction 　
　removal mechanism that uses vapor in the gas inlet.

　　■ Point of use monitor(optional)

　The actual resistivity at the point of use of the cleaning operation can be measured.

　　■ As part of our new corresponding product series, we have released MEGCON II with CE marking.

　　■ Data storage system(optional)

　Data for resistivity, temperature and flow can be fed into a personal computer and displayed on a graph.
　The data is stored and can be utilized in quality control of cleaning operations.
　If the carbon dioxide gas level alarm has been installed,the gas level can be viewed on screen.